Photoresist Stripper
Water-based photoresist cleaner
Burlan’s environmentally friendly water-based photoresist cleaner developed specifically for the semiconductor, electronic manufacturing, and printed circuit board industries. Its unique formula efficiently and safely removes photoresist and contaminants, replacing alkalis and other volatile solvents to reduce adverse environmental effects and improve process efficiency.
Solvent-based photoresist cleaner
Burlan’s unique formula can quickly dissolve and remove hardened photoresist and contaminants, ensuring high quality and stable performance of electronic components and devices.
Product Applications
Water-based photoresist cleaner
● Water-based formula, compliant with environmental regulations
NMP-free, DMSO-free, TMAH-free
● Compatible with various substrate.
Non-corrosive to most metals, including gold, silver, copper, and aluminum, and compatible with cleaning equipment.
● Easy to rinse
After rinsing with pure water, it leaves no residue and does not affect subsequent processing.
● Replaces solvents, saving on costs
Replaces solvents, including NMP, nPB, ACE, IPA, dichloroethylene, and hydrocarbon solvents.
● Customized formula.
If existing products cannot meet the process requirements, customized formula can be developed collaboratively to create a suitable detergent.
Product Applications
Solvent-based photoresist cleaner
● Powerful cleaning capability, High permeability
Quick and effective cleaning efficiency.
● Easy to rinse
After rinsing with pure water, it leaves no residue and does not affect subsequent processing.
● Customized formula.
If existing products cannot meet the process requirements, customized formula can be developed collaboratively to create a suitable detergent.
Product Applications
●Semiconductor materials
Positive and negative photoresist cleaning for photolithography processes, dry film photoresist cleaning for advanced packaging. Substrate cleaning for LEDs, silicon wafers, gallium arsenide, sapphire, silicon carbide, etc.
● Printed circuit boards
● ABF carriers
● Electronic components
Soils
● Positive photoresist
● Negative photoresist
● Dry film photoresist
● Various resins
Epoxy resin, acrylic resin, PVC resin
● Silver paste
● Residual adhesive
● Oxide contamination
Material Compatibility
● Gold, silver, copper, aluminum
Non-corrosive to most metals
● Glass, quartz, sapphire
● Most semiconductor materials
Gallium arsenide, silicon carbide
● Composite materials
*The compatibility of actual materials should be tested under specific cleaning conditions to confirm.
Use Recommandation
● Dilution Rate: Not dilutable
● Temperature: 60-90 ℃
Cleaning Example
Before
After
Before
After
test cleaning service
Cleaning Process
Key Guidance
Stage 1: Evaluation
You can discuss the material of object to be cleaned, type of contaminant, standard of cleanliness, condition of cleaning equipment, and impact on previous or next process for evaluation by phone call or in person.
Stage 2: Sample test cleaning
After confirmation of various conditions, we will provide professional judgment on the selection of detergent, conduct actual sample test, find out optimal cleaning conditions, parameters, and processes, and submit test report.
Stage 3: Actual test
We will provide samples to our customers for small-batch tests.
Stage 4: Joint development
When the test result does not reach the expected target, and both parties agree that it is necessary for our company to conduct the development of new detergent and conditions, they can sign the letter of intent for joint development.
Contact Info
- 02-82925889
- [email protected]
- 6th Floor, No. 86, Section 4, Chengtai Road, Wugu District, New Taipei City